
Inkcazo
IGallium Nitride GaN, I-CAS 25617-97-4, i-molecular mass 83.73, i-wurtzite crystal structure, i-binary compound ye-band-gap semiconductor yeqela le-III-V elikhuliswe ngendlela ephuhliswe kakhulu yenkqubo ye-ammonothermal.Ebonakala ngomgangatho ogqibeleleyo wekristale, ukuhanjiswa kwe-thermal ephezulu, ukuhamba kwe-electron ephezulu, intsimi yombane ebaluleke kakhulu kunye ne-bandgap ebanzi, i-Gallium Nitride GaN ineempawu ezinqwenelekayo kwi-optoelectronics kunye nezicelo zokuva.
Usetyenziso
I-Gallium Nitride GaN ilungele ukuveliswa kwesantya esiphezulu sokusika kunye nomthamo ophezulu okhanyayo okhupha izibane ze-LEDs, izixhobo ze-laser kunye ne-optoelectronics ezifana ne-laser eluhlaza kunye neblue, iimveliso ze-electron mobility transistors (HEMTs) kunye namandla aphezulu. kunye neshishini lokuvelisa izixhobo ezinobushushu obuphezulu.
Ukuhanjiswa
Gallium Nitride GaN at Western Minmetals (SC) Corporation ingabonelelwa ngokobungakanani bafer setyhula 2 intshi ” okanye 4 ” (50mm, 100mm) kunye wafer square 10×10 okanye 10×5 mm.Nabuphi na ubungakanani obulungiselelweyo kunye neenkcukacha zezesisombululo esigqibeleleyo kubathengi bethu kwihlabathi liphela.
Inkcazo yobuGcisa
IGallium Nitride GaNe Western Minmetals (SC) Corporation inganikwa kubungakanani setyhula wafer 2 intshi ” okanye 4 ” (50mm, 100mm) kunye wafer square 10×10 okanye 10×5 mm.Nabuphi na ubungakanani obulungiselelweyo kunye neenkcukacha zezesisombululo esigqibeleleyo kubathengi bethu kwihlabathi liphela.
| Hayi. | Izinto | Inkcazo esemgangathweni | ||
| 1 | Ubume | Isetyhula | Isetyhula | Isikwere |
| 2 | Ubungakanani | 2" | 4" | -- |
| 3 | Ububanzi mm | 50.8±0.5 | 100±0.5 | -- |
| 4 | Ubude becala mm | -- | -- | 10x10 okanye 10x5 |
| 5 | Indlela Yokukhula | HVPE | HVPE | HVPE |
| 6 | Ukuqhelaniswa | Inqwelomoya (0001) | Inqwelomoya (0001) | Inqwelomoya (0001) |
| 7 | Uhlobo lokuqhuba | Uhlobo lwe-N/I-Si-doped, i-Un-doped, i-Semi-insulating | ||
| 8 | Ukuxhathisa Ω-cm | <0.1, <0.05, >1E6 | ||
| 9 | Ukutyeba μm | 350±25 | 350±25 | 350±25 |
| 10 | TTV μm max | 15 | 15 | 15 |
| 11 | Zithobe μm max | 20 | 20 | 20 |
| 12 | EPD cm-2 | <5E8 | <5E8 | <5E8 |
| 13 | Umphezulu Gqiba | P/E, P/P | P/E, P/P | P/E, P/P |
| 14 | Uburhabaxa boMphezulu | Ngaphambili: ≤0.2nm, Emva: 0.5-1.5μm okanye ≤0.2nm | ||
| 15 | Ukupakisha | Isikhongozeli se-wafer esinye esitywinwe kwingxowa yeAluminiyam. | ||
| Ifomula yomgca | GaN |
| Ubunzima beMolekyuli | 83.73 |
| Ubume beCrystal | Zinc blende/Wurzite |
| Imbonakalo | Ukuguquguquka okuqinileyo |
| Indawo yokunyibilika | 2500 °C |
| Indawo yokubilisa | N / A |
| Ukuxinana kwi-300K | 6.15 g/cm3 |
| Umsantsa wamandla | (3.2-3.29) eV kwi-300K |
| Ukuxhathisa kwangaphakathi | >1E8 Ω-cm |
| Inombolo yeCAS | 25617-97-4 |
| Inombolo yeEC | 247-129-0 |
IGallium Nitride GaNilungele ukuveliswa kwesantya esiphezulu kunye nomthamo ophezulu okhanyayo okhupha ukukhanya kwe-LEDs, izixhobo ze-laser kunye ne-optoelectronics ezifana ne-laser eluhlaza kunye neblue, iimveliso ze-electron mobility transistors (HEMTs) kunye namandla aphezulu kunye ne-high-. Ishishini lokuvelisa izixhobo zobushushu.
Iingcebiso zokuthengwa kwempahla
IGallium Nitride GaN