Inkcazo
IGallium Nitride GaN, I-CAS 25617-97-4, i-molecular mass 83.73, i-wurtzite crystal structure, i-binary compound ye-band-gap semiconductor yeqela le-III-V elikhuliswe ngendlela ephuhliswe kakhulu yenkqubo ye-ammonothermal.Ebonakala ngomgangatho ogqibeleleyo wekristale, ukuhanjiswa kwe-thermal ephezulu, ukuhamba kwe-electron ephezulu, intsimi yombane ebaluleke kakhulu kunye ne-bandgap ebanzi, i-Gallium Nitride GaN ineempawu ezinqwenelekayo kwi-optoelectronics kunye nezicelo zokuva.
Usetyenziso
I-Gallium Nitride GaN ilungele ukuveliswa kwesantya esiphezulu sokusika kunye nomthamo ophezulu okhanyayo okhupha izibane ze-LEDs, izixhobo ze-laser kunye ne-optoelectronics ezifana ne-laser eluhlaza kunye neblue, iimveliso ze-electron mobility transistors (HEMTs) kunye namandla aphezulu. kunye neshishini lokuvelisa izixhobo ezinobushushu obuphezulu.
Ukuhanjiswa
Gallium Nitride GaN at Western Minmetals (SC) Corporation ingabonelelwa ngokobungakanani bafer setyhula 2 intshi ” okanye 4 ” (50mm, 100mm) kunye wafer square 10×10 okanye 10×5 mm.Nabuphi na ubungakanani obulungiselelweyo kunye neenkcukacha zezesisombululo esigqibeleleyo kubathengi bethu kwihlabathi liphela.
Inkcazo yobuGcisa
IGallium Nitride GaNe Western Minmetals (SC) Corporation inganikwa kubungakanani setyhula wafer 2 intshi ” okanye 4 ” (50mm, 100mm) kunye wafer square 10×10 okanye 10×5 mm.Nabuphi na ubungakanani obulungiselelweyo kunye neenkcukacha zezesisombululo esigqibeleleyo kubathengi bethu kwihlabathi liphela.
Hayi. | Izinto | Inkcazo esemgangathweni | ||
1 | Ubume | Isetyhula | Isetyhula | Isikwere |
2 | Ubungakanani | 2" | 4" | -- |
3 | Ububanzi mm | 50.8±0.5 | 100±0.5 | -- |
4 | Ubude becala mm | -- | -- | 10x10 okanye 10x5 |
5 | Indlela Yokukhula | HVPE | HVPE | HVPE |
6 | Ukuqhelaniswa | Inqwelomoya (0001) | Inqwelomoya (0001) | Inqwelomoya (0001) |
7 | Uhlobo lokuqhuba | Uhlobo lwe-N/I-Si-doped, i-Un-doped, i-Semi-insulating | ||
8 | Ukuxhathisa Ω-cm | <0.1, <0.05, >1E6 | ||
9 | Ukutyeba μm | 350±25 | 350±25 | 350±25 |
10 | TTV μm max | 15 | 15 | 15 |
11 | Zithobe μm max | 20 | 20 | 20 |
12 | EPD cm-2 | <5E8 | <5E8 | <5E8 |
13 | Umphezulu Gqiba | P/E, P/P | P/E, P/P | P/E, P/P |
14 | Uburhabaxa boMphezulu | Ngaphambili: ≤0.2nm, Emva: 0.5-1.5μm okanye ≤0.2nm | ||
15 | Ukupakisha | Isikhongozeli se-wafer esinye esitywinwe kwingxowa yeAluminiyam. |
Ifomula yomgca | GaN |
Ubunzima beMolekyuli | 83.73 |
Ubume beCrystal | Zinc blende/Wurzite |
Imbonakalo | Ukuguquguquka okuqinileyo |
Indawo yokunyibilika | 2500 °C |
Indawo yokubilisa | N / A |
Ukuxinana kwi-300K | 6.15 g/cm3 |
Umsantsa wamandla | (3.2-3.29) eV kwi-300K |
Ukuxhathisa kwangaphakathi | >1E8 Ω-cm |
Inombolo yeCAS | 25617-97-4 |
Inombolo yeEC | 247-129-0 |
IGallium Nitride GaNilungele ukuveliswa kwesantya esiphezulu kunye nomthamo ophezulu okhanyayo okhupha ukukhanya kwe-LEDs, izixhobo ze-laser kunye ne-optoelectronics ezifana ne-laser eluhlaza kunye neblue, iimveliso ze-electron mobility transistors (HEMTs) kunye namandla aphezulu kunye ne-high-. Ishishini lokuvelisa izixhobo zobushushu.
Iingcebiso zokuthengwa kwempahla
IGallium Nitride GaN