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I-Epitaxial (EPI) I-Silicon Wafer

Inkcazo

I-Epitaxial Silicon Waferokanye i-EPI Silicon Wafer, yiwafer ye-semiconducting crystal layer efakwe kwindawo yekristale epholisiweyo ye-silicon substrate ngokukhula kwe-epitaxial.Umaleko we-epitaxial unokuba yinto efanayo kunye ne-substrate ngokukhula kwe-epitaxial e-homogeneous, okanye umaleko ongaqhelekanga kunye nomgangatho onqwenelekayo othile ngokukhula kwe-epitaxial, eyamkela iteknoloji yokukhula kwe-epitaxial iquka i-chemical vapor deposition CVD, isigaba se-epitaxy LPE, kunye ne-molecular beam. I-epitaxy MBE ukufezekisa umgangatho ophezulu wobuninzi besiphako esisezantsi kunye noburhabaxa obuphezulu bomgangatho.I-Silicon Epitaxial Wafers isetyenziswa ikakhulu kwimveliso yezixhobo eziphambili ze-semiconductor, izinto ezidityaniswe kakhulu ze-semiconductor ICs, izixhobo ezidityanisiweyo kunye nezixhobo zamandla, ezikwasetyenziselwa i-element ye-diode kunye ne-transistor okanye i-substrate ye-IC efana nohlobo lwe-bipolar, i-MOS kunye nezixhobo ze-BiCMOS.Ngapha koko, ii-epitaxial ezininzi kunye nefilimu eshinyeneyo ye-EPI silicon wafers zihlala zisetyenziswa kwi-microelectronics, photonics kunye nesicelo se-photovoltaics.

Ukuhanjiswa

I-Epitaxial Silicon Wafers okanye i-EPI Silicon Wafer kwi-Western Minmetals (SC) Corporation inokunikezelwa ngobukhulu be-4, 5 kunye ne-6 intshi (100mm, 125mm, 150mm ububanzi), kunye ne-orientation <100>, <111>, i-epilayer resistivity ye- <1ohm -cm okanye ukuya kuthi ga kwi-150ohm-cm, kunye nobukhulu be-epilayer ye<1um okanye ukuya kuthi ga kwi-150um, ukwanelisa iimfuno ezahlukeneyo ekugqityweni komphezulu we-etched okanye unyango lwe-LTO, epakishwe kwikhasethi enebhokisi yebhokisi ngaphandle, okanye njengoko kucacisiwe ngokwezifiso kwisisombululo esigqibeleleyo. . 


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I-Epi Silicon Wafer

SIE-W

Epitaxial Silicon Wafersokanye i-EPI Silicon Wafer kwi-Western Minmetals (SC) Corporation inokunikezelwa ngobukhulu be-4, 5 kunye ne-6 intshi (100mm, 125mm, 150mm ububanzi), kunye ne-orientation <100>, <111>, i-epilayer resistivity ye- <1ohm-cm okanye ukuya kuthi ga kwi-150ohm-cm, kunye nobukhulu be-epilayer ye-<1um okanye ukuya kuthi ga kwi-150um, ukwanelisa iimfuno ezahlukeneyo ekugqityweni komphezulu we-etched okanye unyango lwe-LTO, epakishwe kwikhasethi enebhokisi yebhokisi ngaphandle, okanye njengoko kucacisiwe ngokwezifiso kwisisombululo esigqibeleleyo.

Uphawu Si
Inombolo yeAtom 14
Ubunzima beAtom 28.09
Udidi lweNqanaba Metalloid
Iqela, Ixesha, Block 14, 3, P
Ubume beCrystal Idayimani
Umbala Ingwevu emnyama
Indawo yokunyibilika 1414°C, 1687.15 K
Indawo yokubilisa 3265°C, 3538.15 K
Ukuxinana kwi-300K 2.329 g/cm3
Ukuxhathisa kwangaphakathi 3.2E5 Ω-cm
Inombolo yeCAS 7440-21-3
Inombolo yeEC 231-130-8
Hayi. Izinto Inkcazo esemgangathweni
1 Iimpawu eziqhelekileyo
1-1 Ubungakanani 4" 5" 6"
1-2 Ububanzi mm 100±0.5 125±0.5 150±0.5
1-3 Ukuqhelaniswa <100>, <111> <100>, <111> <100>, <111>
2 Iimpawu ze-Epitaxial Layer
2-1 Indlela Yokukhula CVD CVD CVD
2-2 Uhlobo lokuqhuba P okanye P+, ​​N/ okanye N+ P okanye P+, ​​N/ okanye N+ P okanye P+, ​​N/ okanye N+
2-3 Ukutyeba μm 2.5-120 2.5-120 2.5-120
2-4 Ukutyeba Ukufana ≤3% ≤3% ≤3%
2-5 Ukuxhathisa Ω-cm 0.1-50 0.1-50 0.1-50
2-6 Ukuxhathisa ukufana ≤3% ≤5% -
2-7 Ukususwa kwe-cm-2 <10 <10 <10
2-8 Umgangatho womphezulu Akukho chip, i-haze okanye i-orange peel ihlala, njl.
3 Phatha iimpawu zeSubstrate
3-1 Indlela Yokukhula CZ CZ CZ
3-2 Uhlobo lokuqhuba P/N P/N P/N
3-3 Ukutyeba μm 525-675 525-675 525-675
3-4 Ukutyeba Uniformity max 3% 3% 3%
3-5 Ukuxhathisa Ω-cm Njengoko kufuneka Njengoko kufuneka Njengoko kufuneka
3-6 Ukuxhathisa ukufana 5% 5% 5%
3-7 TTV μm max 10 10 10
3-8 Zithobe μm max 30 30 30
3-9 Warp μm max 30 30 30
3-10 EPD cm-2 max 100 100 100
3-11 Iprofayile yomda Isondezwe Isondezwe Isondezwe
3-12 Umgangatho womphezulu Akukho chip, i-haze okanye i-orange peel ihlala, njl.
3-13 Icala elingasemva Gqiba I-Etched okanye i-LTO (5000±500Å)
4 Ukupakisha Ikhasethi ngaphakathi, ibhokisi yeebhokisi ngaphandle.

I-Silicon Epitaxial Waferszisetyenziswa ikakhulu kwimveliso yezixhobo eziphambili zesemiconductor, izinto ezidityaniswe kakhulu zesemiconductor ii-ICs, izixhobo ezidityanisiweyo kunye nezamandla, ezikwasetyenziselwa isiqalelo se-diode kunye ne-transistor okanye i-substrate ye-IC efana nohlobo lwe-bipolar, izixhobo ze-MOS kunye ne-BiCMOS.Ngapha koko, ii-epitaxial ezininzi kunye nefilimu eshinyeneyo ye-EPI silicon wafers zihlala zisetyenziswa kwi-microelectronics, photonics kunye nesicelo se-photovoltaics.

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SIE-W1

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SIE-W3

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PK-26 (2)

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I-Epitaxial Silicon Wafer


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