Inkcazo
I-Epitaxial Silicon Waferokanye i-EPI Silicon Wafer, yiwafer ye-semiconducting crystal layer efakwe kwindawo yekristale epholisiweyo ye-silicon substrate ngokukhula kwe-epitaxial.Umaleko we-epitaxial unokuba yinto efanayo kunye ne-substrate ngokukhula kwe-epitaxial e-homogeneous, okanye umaleko ongaqhelekanga kunye nomgangatho onqwenelekayo othile ngokukhula kwe-epitaxial, eyamkela iteknoloji yokukhula kwe-epitaxial iquka i-chemical vapor deposition CVD, isigaba se-epitaxy LPE, kunye ne-molecular beam. I-epitaxy MBE ukufezekisa umgangatho ophezulu wobuninzi besiphako esisezantsi kunye noburhabaxa obuphezulu bomgangatho.I-Silicon Epitaxial Wafers isetyenziswa ikakhulu kwimveliso yezixhobo eziphambili ze-semiconductor, izinto ezidityaniswe kakhulu ze-semiconductor ICs, izixhobo ezidityanisiweyo kunye nezixhobo zamandla, ezikwasetyenziselwa i-element ye-diode kunye ne-transistor okanye i-substrate ye-IC efana nohlobo lwe-bipolar, i-MOS kunye nezixhobo ze-BiCMOS.Ngapha koko, ii-epitaxial ezininzi kunye nefilimu eshinyeneyo ye-EPI silicon wafers zihlala zisetyenziswa kwi-microelectronics, photonics kunye nesicelo se-photovoltaics.
Ukuhanjiswa
I-Epitaxial Silicon Wafers okanye i-EPI Silicon Wafer kwi-Western Minmetals (SC) Corporation inokunikezelwa ngobukhulu be-4, 5 kunye ne-6 intshi (100mm, 125mm, 150mm ububanzi), kunye ne-orientation <100>, <111>, i-epilayer resistivity ye- <1ohm -cm okanye ukuya kuthi ga kwi-150ohm-cm, kunye nobukhulu be-epilayer ye<1um okanye ukuya kuthi ga kwi-150um, ukwanelisa iimfuno ezahlukeneyo ekugqityweni komphezulu we-etched okanye unyango lwe-LTO, epakishwe kwikhasethi enebhokisi yebhokisi ngaphandle, okanye njengoko kucacisiwe ngokwezifiso kwisisombululo esigqibeleleyo. .
Inkcazo yobuGcisa
Epitaxial Silicon Wafersokanye i-EPI Silicon Wafer kwi-Western Minmetals (SC) Corporation inokunikezelwa ngobukhulu be-4, 5 kunye ne-6 intshi (100mm, 125mm, 150mm ububanzi), kunye ne-orientation <100>, <111>, i-epilayer resistivity ye- <1ohm-cm okanye ukuya kuthi ga kwi-150ohm-cm, kunye nobukhulu be-epilayer ye-<1um okanye ukuya kuthi ga kwi-150um, ukwanelisa iimfuno ezahlukeneyo ekugqityweni komphezulu we-etched okanye unyango lwe-LTO, epakishwe kwikhasethi enebhokisi yebhokisi ngaphandle, okanye njengoko kucacisiwe ngokwezifiso kwisisombululo esigqibeleleyo.
Uphawu | Si |
Inombolo yeAtom | 14 |
Ubunzima beAtom | 28.09 |
Udidi lweNqanaba | Metalloid |
Iqela, Ixesha, Block | 14, 3, P |
Ubume beCrystal | Idayimani |
Umbala | Ingwevu emnyama |
Indawo yokunyibilika | 1414°C, 1687.15 K |
Indawo yokubilisa | 3265°C, 3538.15 K |
Ukuxinana kwi-300K | 2.329 g/cm3 |
Ukuxhathisa kwangaphakathi | 3.2E5 Ω-cm |
Inombolo yeCAS | 7440-21-3 |
Inombolo yeEC | 231-130-8 |
Hayi. | Izinto | Inkcazo esemgangathweni | ||
1 | Iimpawu eziqhelekileyo | |||
1-1 | Ubungakanani | 4" | 5" | 6" |
1-2 | Ububanzi mm | 100±0.5 | 125±0.5 | 150±0.5 |
1-3 | Ukuqhelaniswa | <100>, <111> | <100>, <111> | <100>, <111> |
2 | Iimpawu ze-Epitaxial Layer | |||
2-1 | Indlela Yokukhula | CVD | CVD | CVD |
2-2 | Uhlobo lokuqhuba | P okanye P+, N/ okanye N+ | P okanye P+, N/ okanye N+ | P okanye P+, N/ okanye N+ |
2-3 | Ukutyeba μm | 2.5-120 | 2.5-120 | 2.5-120 |
2-4 | Ukutyeba Ukufana | ≤3% | ≤3% | ≤3% |
2-5 | Ukuxhathisa Ω-cm | 0.1-50 | 0.1-50 | 0.1-50 |
2-6 | Ukuxhathisa ukufana | ≤3% | ≤5% | - |
2-7 | Ukususwa kwe-cm-2 | <10 | <10 | <10 |
2-8 | Umgangatho womphezulu | Akukho chip, i-haze okanye i-orange peel ihlala, njl. | ||
3 | Phatha iimpawu zeSubstrate | |||
3-1 | Indlela Yokukhula | CZ | CZ | CZ |
3-2 | Uhlobo lokuqhuba | P/N | P/N | P/N |
3-3 | Ukutyeba μm | 525-675 | 525-675 | 525-675 |
3-4 | Ukutyeba Uniformity max | 3% | 3% | 3% |
3-5 | Ukuxhathisa Ω-cm | Njengoko kufuneka | Njengoko kufuneka | Njengoko kufuneka |
3-6 | Ukuxhathisa ukufana | 5% | 5% | 5% |
3-7 | TTV μm max | 10 | 10 | 10 |
3-8 | Zithobe μm max | 30 | 30 | 30 |
3-9 | Warp μm max | 30 | 30 | 30 |
3-10 | EPD cm-2 max | 100 | 100 | 100 |
3-11 | Iprofayile yomda | Isondezwe | Isondezwe | Isondezwe |
3-12 | Umgangatho womphezulu | Akukho chip, i-haze okanye i-orange peel ihlala, njl. | ||
3-13 | Icala elingasemva Gqiba | I-Etched okanye i-LTO (5000±500Å) | ||
4 | Ukupakisha | Ikhasethi ngaphakathi, ibhokisi yeebhokisi ngaphandle. |
I-Silicon Epitaxial Waferszisetyenziswa ikakhulu kwimveliso yezixhobo eziphambili zesemiconductor, izinto ezidityaniswe kakhulu zesemiconductor ii-ICs, izixhobo ezidityanisiweyo kunye nezamandla, ezikwasetyenziselwa isiqalelo se-diode kunye ne-transistor okanye i-substrate ye-IC efana nohlobo lwe-bipolar, izixhobo ze-MOS kunye ne-BiCMOS.Ngapha koko, ii-epitaxial ezininzi kunye nefilimu eshinyeneyo ye-EPI silicon wafers zihlala zisetyenziswa kwi-microelectronics, photonics kunye nesicelo se-photovoltaics.
Iingcebiso zokuthengwa kwempahla
I-Epitaxial Silicon Wafer